Nature

Plasma Etching and Charging Effects in Semiconductor Processing

Plasma etching is a cornerstone technique in semiconductor fabrication, enabling the precise removal of material layers through the use of ionised gases. This process is essential for fabricating ...
Yahoo

After 20 years of research, DirectDrive plasma etching tech to transform chip making

Imagine trying to carve a tiny, complex sculpture into a block the size of your fingernail again and again, billions of times, with nearly no room for error. That’s ...
AZOM

Advancements in Plasma Etching and Deposition Processes for Compound Semiconductor Materials Applications

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
FMIBlog

Global Etching Process Parts Market Outlook 2025–2035: Growth Accelerates with Semiconductor Advances

Future Market Insights, Inc. (FMI) is an ESOMAR-certified, ISO 9001:2015 market research and consulting organization, trusted ...
EurekAlert!

Large-scale (4-inch) plasma etching technology for mass production of next-generation two-dimensional semiconductors has been developed for the first time in the world

A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...
Nature

Plasma Etching and Atomic Layer Etching Processes

Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...
AZOM

High-Density Plasma to Achieve Fast Etching and Deposition Rates—PlasmaPro 100 Cobra

Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The PlasmaPro 100 Cobra ICP RIE system ...
동아사이언스

Breakthrough Ceramic Extends Lifespan of Semiconductor Etching Equipment

A method has been developed to extend the lifespan of equipment used in the etching process for semiconductor manufacturing. The etching process is a step in making semiconductors where specific parts ...
Semiconductor Engineering

Semiconductor Device Manufacturing Process Challenges And Opportunities

Major processes in semiconductor wafer fabrication: 1) wafer preparation, 2) pattern transfer, 3) doping, 4) deposition, 5) etching, and 6) packaging. The process of creating semiconductors can be ...
Semiconductor Engineering

The Evolution Of Plasma Process Power

The year 1981 was notable for a variety of technology breakthroughs. It saw the inaugural mission of the Space Shuttle Columbia and the debut of the DeLorean car. The IBM PC, Commodore 64, and the ...
Nanowerk

Reactive Ion Etching (RIE): Precise Nanoscale Patterning for Advanced Devices

What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...
Nanowerk

Large-scale (4-inch) plasma etching technology for mass production of next-generation two-dimensional semiconductors

(Nanowerk News) A groundbreaking plasma etching technology has been developed that promises to form the bedrock for the industrial production of molybdenum disulfide (MoS2), a next-generation ...